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Rene Haueis is currently a Principal Process Engineer Lithography at NXP Semiconductors, where they lead various projects including resist volume reduction and resist platform consolidation, while also serving as a member of the Lithography Expert Team. Previously, Rene worked as a Process Engineer Lithography at Systems on Silicon Manufacturing Company Pte Ltd for a brief period in 2014 and held the position of Principal Process Engineer Lithography at Philips Semiconductors from 1995 to 2006. Rene earned a Dipl.-Ing. in physics of electronic components from Technische Universität Chemnitz and a TWAIO in electronic instrumentation from Delft University of Technology.